2012
MAS 2012 Proceeding
Advanced etching algorithms for process simulation of 3D MEMS-TUNABLE lasers
Authors: Abderrazzak El Boukili
Abstract
We are proposing new and advanced etching algorithms for the process simulation of three dimensional (3D) micro electro mechanical systems (MEMS)-tunable vertical cavity semiconductor optical amplifiers (VCSOAs). These algorithms are based on advanced domain decomposition methods, Delaunay meshing algorithms, and surface re-meshing and smoothing techniques. These algorithms are simple, robust, and significantly reduce the overall run time of the process simulation of 3D MEMS-tunable laser devices. The description of the proposed etching algorithms will be presented. Numerical simulation results showing the performances of these algorithms will be given and analyzed for realistic 3D MEMS devices and MEMS-tunable laser devices.
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