2011
EMSS 2011 Proceeding
A Simulation-Based Framework for Industrial Automated Wet-Etch Station Scheduling Problem In The Semiconductor Industry
Authors: Adrian Aguirre, Vanina Cafaro, Carlos Mendez, Pedro Castro
Abstract
This work presents the development and application of an advanced modelling, simulation and optimization- based framework to the efficient operation of the Automated Wet-etch Station (AWS), a critical stage in Semiconductor Manufacturing Systems (SMS). Lying on the main concepts of the process- interaction approach, principal components and tools available in the Arena® simulation software were used to achieve the best representation of this complex and highly-constrained manufacturing system. Furthermore, advanced Arena templates were utilized for modelling very specific operation features arising in the process under study. The major aim of this work is to provide a novel computer-aided tool to systematically improve the dynamic operation of this critical manufacturing station by quickly generating efficient schedules for the shared processing and transportation devices.
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